When the ion beam center coincides with the sample rotation center, the center of the sample material is removed at a higher rate than the surrounding area. Pumping options include cryo, turbo, or diffusion pump. Sputtered material from the target then deposits on a nearby substrate, creating a thin film. The following paper outlines the working principles of sputterion pumps. A neg pump can be placed at the ends of the vacuum vessel and the sides of the vessel can be coated with neg material. The collision point would then see 107 torr as long as the outgassing rate of the aluminum rf shield and the stainless steel bellows is on the order of 1010 torrlseccm2. A sputter ion pump consists basically of two electrodes, anode and cathode, and a magnet fig. Pdf distributed sputterion pumps for use in low magnetic. Procedure rf sputtering using cvc 601 tool pump down 1. Momentum transfer pump molecular vacuum pump, sheet metal file cabinet editing and analysis jet vacuum pump, diffusion pump, diffusion jet pump, ion transfer pump. Pdf application of compact negsputter ion pump combination. Ion beam depositon system torr internationalservices llc. Detail of inlet port of sip 270 ls is d inner diameter 146. Under ideal conditions, ion pumps are capable of reaching pressures as low as 10.
The development of mechanical pumps was intimately linked with the progress of vacuum science up to the middle of this century when the introduction of both the sputter ion pump and the sublimation pump provided an alternate method for the production of low pressure. Close chamber lid by flipping the chamber cover toggle down. Application of compact negsputter ion pump combination in uhv system of hiaf article pdf available in vacuum 157 august 2018 with 90 reads how we measure reads. Ixrf systems msp2s magnetron target ion sputter coater by ixrf systems inc. Selected uhv pump for test setup is sputterion pump sip270ls. An ion pump also referred to as a sputter ion pump is a type of vacuum pump capable of reaching pressures as low as 10. Additions can include magnetron guns, a thermal resistance source or electron beam evaporation. Any information provided is not binding, can and will be changed without further notice. Set the timer and allow the turbo pump to spin down for 10 minutes before introducing uhp nitrogen vent gas. An ion pump first ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv. Leybold vacuum academy l d o b y e l for further information on a wide range of courses in vacuum technology please contact the leybold training center in cologne. Click on off after acceptable sputter cleaning has been achieved 14. Occasionally, questions or problems about performance may arise and this document is meant to help with resolving those issues. The user has a choice of gas controls for reactive and nonreactive sputtering.
Sputter ion pump models v20, v30, v60, v110, v140, v220, v270. The ion beam exhibits a gaussian shaped current density pro. Our iso 9001 certified materials division stocks a vast assortment of high purity materials, evaporation sources, and crucible liners for use in both thermal and ebeam evaporation as well as sputter deposition processes. As with all gas capture pumps, the sputter ion pump requires no backing pump, and does have a limited lifetime, based on its. Atmospheric, cleaning solvents, rotary pump oil during initial pump down, diffusion pump fluid polyether, and outgassing of anodes and filaments.
Magnetron sputtering system torr internationalservices llc. Agilent celebrates the 60 year anniversary of the ion pump invention at varian associates by j. Ion pump physics, or sputter ion pump, a type of vacuum pump which operates by sputtering a metal getter. Optimization of sputter ion pumps 4 technology innovation in uhv 8 references11. Prevac offers custom deposition systems designed and manufactured to exact specifications for customer specific process applications. White hall sputter station standard operating procedure revised.
This differential sputtering again shifts the areas of burial and net buildup of sputtered material to an extent which results in stable pumping of noble gases. Ion pump features and benefits 2 ion pump evolution since the late 1950s, when the ion pump was invented at varian, many changes and technical improvements have taken place. Skeletalmuscle pump, a collection of skeletal muscles that aid the heart in the circulation of blood. Conventional sputter ion pump power supplies tend to be heavy and bulky as they operate on the mains frequency viz. An ion pump ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 3kv to 7kv, which allows the ions to accelerate into and be captured by a. There are six magnetron sputtering guns plus one plasma gun and an ion gun in the chamber. A new approach for computing diode sputterion pump. As the sample rotation and swing center are varied with respect to the ion. The early history 1 ultra high vacuum technology 3 operation at high pressure 4 optimization of sputter ion pumps 4 technology innovation in uhv 8 references11. Mechanical pump turns on and automatically performs the following steps a.
The compact switched mode triode sputter ion pump power supply made in barc is based on a half bridge dc to dc converter operating at 20khz resulting in a drastic size reduction of around 75% over conventional. Hydrogen 150 to 200% methane 100% other lightweight hydrocarbons 80 to 120% oxygen 80% argon 30% helium 28% sputter ion pumps allow, based on the discharge current, the measurement of the pressure within the vacuum cham. Procedure rf sputtering using cvc 601 tool 058 file. Ion beam deposition ibd is a vacuum deposition process that uses a broad beam ion source directly focused on a sputtering target. The pumping mechanisms for reactive and inert gas species, as well as argon. The pumping speed is achieved by parallel connection of many individual penning cells.
The lab book can now include an unlimited number for data file entries. Design and construction of a prototype sputter ion pump in ilsf. Some applications will use an assembly of sputter targets that can be indexed to create multilayer thin films. Discoverytm18 deposition system page number do1057002 do1054102 d0004. Vacuum science and technology for accelerator vacuum. Miniature sputterion pump design considerations duniway.
An overview of sputterion pump weight versus pumping speed will initially be presented. Switch is located on automatic valve control panel. An ion pump also referred to as a sputter ion pump is a type of vacuum pump which operates by sputtering a metal getter. The pumping effect of sputter ion pumps is produced by sorption processes, which are released by ionised gas particles. Ion pumps sputter ion pumps, getter ion pumps, penning pumps provide a clean, simple, low maintenance alternative for producing and maintaining high and ultrahigh vacuum. Ixrf systems msp2s vacum device magnetron target ion. The exponential dependence of field emission leakage current versus operating. For the purposes of this laboratory, we will describe the operation of a single cell diode type sputter ion vacuum pump. Msp2s is the metal coating apparatus to improve the generating efficiency of the secondary electron, and preventing from the chargeup of the sample while sem. Study of plasma and ion beam sputtering processes 129 of an ion source for a particular application should be made with due consideration of factors such as species and intensity capability, beam quality emittance and brightness, ionization efficiency, reliability,ease of operation, maintenance, and source lifetime. Distributed sputterion pumps for use in low magnetic fields article pdf available in ieee transactions on nuclear science 263. The accusputter aw 4450series production sputtering systems are manufactured in the configuration of a manuallyloaded system capable of fully. Kjlc manufactures, assembles, tests, and integrates torus magnetron sputtering cathodes, resistive thermal evaporation equipment, and point source evaporators, both as standalone products to the vacuum science market and for use in our own thin film vacuum deposition systems.
The gettering can be accomplished by making the pump wall very cold cryopumps or by ionizing gas within a magnetically confined cold cathode discharge ion pumps. Ion pump sputter ion pump modion ion vacuum pumps by j. At high operating voltages, leakage currents, especially field emission currents, interfere with using the ion pump current as an indicator of pressure. How to classify vacuum pump vacuum pump is a kind of sealed container and vacuum equipment which is extracted by mechanical or physical chemical methods, and is essentially a. The chamber can be designed to accept additional evaporation sources, and unused ports are blocked off with flanges to allow future additions. The magnetron sputtering system is completely customizable. A sputterion pump consists basically of two electrodes, anode and cathode, and a magnet. The anode is usually cylindrical and made of stainless steel. Mar 15, 2016 9 sputter ion pump sputter ion pumps are a type of capture pump, wherein air molecules are removed from the chamber by plating gettering them onto a surface. Sputterion pumps are next discussed, but the detail level of this discussion is gauged to the students needs. Virtually all of the major innovations have come from varian, from the first diode vacion pump to the triode, then to the starcell series pumps, and the vacion plus. Close the roughing pump to the turbo pump by turning the valve counterclockwise see figure 14. Using the anode layer ion source from as an ion pump.
Sputterion pumps were first commercialized by varian. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a. The carbon contamination layer has been examined as a source of carbide formation at the near surface region of the substrate of a high purity cr sample. Two dc power supply and one af power supply provide the means of sputter both metal and oxides. All systems may incor porate a liquid nitrogen pump trap or refrigeration system for high speed pumping of water vapor and other condensibles. Operating principle of sputter ion pumps ions from a gas discharge impinge on the cathode of an electrode system within the pump housing thereby sputtering the cathode material titanium, in conventional pumps. We can develop simple singlechamber systems for easy applications to complex multichamber computercontrolled systems for xps, ups, spm, leed, mbe and many different applications. To get uhv in test setup, it is required to bake the whole setup at 250c. Support selecting sputter gun type per layer in sputter. Laser pumping, the act of energy transfer from an external source into the gain medium of a laser. Vacuum pumps types vacuum pump evp vacuum solution.
943 206 1028 663 148 524 1596 1113 857 734 259 117 1408 728 834 1227 829 1335 1431 1579 1316 526 1151 569 1098 498 207 1493 384 387 884 213 1123 1347 1141 1234 1116 387